Waferpedia

Comparison ledger

017-0146-01 PrealignerversusNSR-1505G4

Brooks 017-0146-01 Prealigner, Nikon NSR-1505G4, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
OEMBrooksNikon
CategoryLithographyLithography
Wafer size—4"
Process node—better than 750 nm resolution; better than 150 nm alignment
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation—g-line
FamilyBrooks 017-0146-01 PrealignerNikon NSR-1505G4
Specifications
Type—Wafer stepper[1]
Reduction—5x reduction[1]
Reticle size—5" reticle[1]
Wafer size—4" wafers[1]
Exposure source—g-line UV[1]
Resolution—better than 750 nm[1]
Alignment—better than 150 nm[1]
Reduction factor—5x[1]
Alignment accuracy—better than 150 nm[1]

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Sources (1)Every fact above is drawn from these public sources
  1. [1]nanofab.ece.cmu.edunanofab.ece.cmu.edu