Brooks
017-0146-01 Prealigner alternatives
Comparable Lithography equipment documented in the Waferpedia catalog.
6 comparable tools
Brooks
017-0024-01 Prealigner
Lithography
Ultratech
1000 Family
Lithography
EV Group
101
Lithography
The EVG 101 is an advanced resist processing system for spin or spray coating and developing of wafers up to 300 mm.
SUSS MicroTec
150 e Mask
Lithography
The SUSS 150 e is a mask aligner manufactured by SUSS MicroTec.
Nikon
1505 G 6 E
Lithography
The Nikon 1505 G 6 E is a g-line stepper introduced in 1988 with a numerical aperture of 0.54 and a resolution of 650 nm.
Nikon
1505 G 7 E
Lithography
The Nikon 1505 G 7 E is a stepper used in lithography on 6-inch wafers with a 5-inch reticle.
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