Waferpedia

Comparison ledger

017-0024-01 Prealignerversus350W MJB3 Mask

Brooks 017-0024-01 Prealigner, SUSS MicroTec 350W MJB3 Mask, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
350W MJB3 MaskSUSS MicroTec
OEMBrooksSUSS MicroTec
CategoryLithographyLithography
Wafer size—Wafer Equipment
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyBrooks 017-0024-01 PrealignerSUSS MicroTec 350W MJB3 Mask
Specifications
Wafer size—Wafer Equipment[1]
- Model—MJB3 Main System[1]
- Manufacturer—Suss MicroTec / Karl Suss[1]
- Max Wafer Size—3" Diameter[1]
- Eyepieces—10x[1]
- Objectives—3.5x and 10x[1]
- Exposure Mode—Vacuum Contact, Hard & Soft[1]
- Exposure Resolution—0.8 Microns (under optimum conditions)[1]
- Alignment Resolution—0.25um (operator dependant)[1]
Alignment mode—Top Side Alignment[1]
Power supply—CIC 500[1]
Lamphouse—350 watt[1]
Exposure optics—UV400 exposure optics for 365nm and 405nm exposure[1]
Microscope—Suss M230 Splitfield Microscope[1]
Maskholder—1 included for 4"x4" masks[1]
Wafer chuck—1 included[1]
Bulb—Brand new 350W bulb, qty. 1 included[1]
Manual—Operations Manual for Suss MJB3 Mask Aligner[1]
Configured for—Top Side Alignment[1]

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Sources (1)Every fact above is drawn from these public sources
  1. [1]dealer listingwotol.com