Waferpedia

Comparison ledger

017-0024-01 Prealignerversus200

Brooks 017-0024-01 Prealigner, OAI 200, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
200OAI
OEMBrooksOAI
CategoryLithographyLithography
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyBrooks 017-0024-01 PrealignerOAI 200
Specifications
OEM—OAI[1]
Model—200[1]
Tool owner—Brian Baker[1]
Serial number—1213[1]
Location—Bay B[2]
Substrate size accommodation—up to 6"x6"[3]
Mask size accommodation—2"x2" to 7"x7"[3]
Maximum mask size (datasheet)—up to 9"x9"[4]
Alignment precision—1 micron[5]
Vacuum Chuck X, Y travel—±0.47" (12mm)[3]
Vacuum Chuck Z travel—±0.12" (3mm)[3]
Vacuum Chuck rotation—±7°[3]
Substrate Stage X, Y travel (datasheet)—±10mm[4]
Z travel (datasheet)—1500 microns[4]
Rotation (datasheet)—±3.5°[4]
Lamp power range—200W to 2000W[5]
UV wavelength range—Near or Deep UV (220nm to 436nm)[3]
Exposure intensity control—±2% of desired intensity[5]
Timer range—0-1000 seconds in 1 second intervals[3]
Dimensions (width)—31 inches[3]
Dimensions (height)—37 inches (datasheet: 37")[4]
Weight—250 lbs[4]

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Sources (5)Every fact above is drawn from these public sources
  1. [1]nanofab.utah.edunanofab.utah.edu
  2. [2]nanofab.utah.edunanofab.utah.edu
  3. [3]manualslib.commanualslib.com
  4. [4]oainet.comoainet.com
  5. [5]oainet.comoainet.com