Waferpedia

Comparison ledger

0 V 500versus8-2P-CP

Blue M 0 V 500, YES 8-2P-CP, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0 V 500Blue M
OEMBlue MYES
CategoryThermal / DiffusionThermal / Diffusion
Wafer size—200mm
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyBlue M 0 V 500YES 8-2P-CP
Cited variants—
Specifications
Model—8-2P-CP[1]
Series—YES-PB Series[1]
Wafer size—200 mm wafers[1]
Load type—manual load[2]
Process interface—touch screen interface enables the process to be fully automated[2]
Cooling package—uses air, no water[2]
Airflow—vertical laminar airflow[2]
Condensate control—coalescing condensate trap assembly[2]
Process type—manual-load high-temperature cure oven[2]
Applications—Polyimide/PBO cure; BCB bake; Low temp polymers cure; Copper anneal; Low-K dielectric cure; Copper oxide removal; Aluminum anneal[2]

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Sources (2)Every fact above is drawn from these public sources
  1. [1]web.archive.orgweb.archive.org
  2. [2]web.archive.orgweb.archive.org