Waferpedia

Comparison ledger

0 500versus8800

Blue M 0 500, Mattson 8800, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0 500Blue M
8800Mattson
OEMBlue MMattson
CategoryThermal / DiffusionThermal / Diffusion
Wafer size—200mm
Process node—0.25-micron
Introduced—1997
Production run——
Lifecycle——
Lifecycle milestones—1997 Award recognition · 1997 Product award
Control system——
Generation—third-generation
FamilyBlue M 0 500Mattson 8800
Specifications
ManufacturerBlue M[1]—
Model0 500[1]—
Asset number139866[1]—
Last confirm dateSeptember 10, 2025[1]—
Equipment typeOven[1]—
Tool type—Third-generation RTP tool[2]
Process target—0.25-micron process requirements[2]
Wafer size—200 mm[2]
Wafer format—Single-wafer[2]
Temperature performance—Improves temperature uniformity and repeatability[2]
Throughput—Significantly boosts throughput[2]
Ceramic Shield option—Backside emissivity independence and better wafer-to-wafer repeatability[2]
Nitrogen curtain—Minimum pre-purge time and high-throughput configuration[2]
High process purge gas flow—Fast chamber purging for high-throughput configuration[2]
ez-DTC—High-throughput configuration and improved control[2]
High temperature end effector—High-throughput configuration[2]
Double O-ring seal system—Prevents product loss[2]
Swivel cassettes with independent swivels—Higher throughput[2]
Standard slip-free ring package—High temperature slip-free processing and improved uniformity[2]
Certifications—CE certified and UL listed[2]
Generation—third-generation RTP tool[2]
Process node—0.25-micron[2]
Award—Semiconductor International Editor's Choice Best Product Award (1997)[2]

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Sources (2)Every fact above is drawn from these public sources
  1. [1]Equipment inventory listing
  2. [2]web.archive.orgweb.archive.org