Comparison ledger
Axcelis NV 8200, Varian 160 XP, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | NV 8200Axcelis | 160 XPVarian |
|---|---|---|
| OEM | Axcelis | Varian |
| Category | Ion Implantation | Ion Implantation |
| Wafer size | 200mm | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Axcelis NV 8200 | Varian 160 XP |
| Cited variants | — |
|
| Specifications | ||
| Energy config. | from 3 to 250keV (single); up to 750 keV (triple)[2] | — |
| Wafer size | Wafer size 200mm with holders for different wafers sizes[2] | — |
| Dose | > 1E11at/cm²[2] | — |
| Beam current | I < 1mA[2] | — |
| Configuration | Gas lines:[2] | — |
| Ion sources | 3 ion sources with dual vaporizer on each source[2] | — |
| Magnet | Dipole magnet 90° - Buckley Systems – de 0 a 75 AMU in full charge[2] | — |
| Cryo compressor | CTI Cryogenics 9600[2] | — |
| Make | Axcelis[3] | — |
| Model | NV 8200[3] | — |
| Wafer Sizes | 8 inch[4] | — |
| Process gas lines | 4 process gas lines (BF2/PH3/AsH3/Hydrogen)[2] | — |
| Gas line | 1 gas line (Argon)[2] | — |
| Mass range | 0 to 75 AMU in full charge[2] | — |
| Target positioning / scanning system | Parallel beam; electrostatic angle correction programmable; tilt 0°-60°[2] | — |
| End station | Flat/notch alignment with buffet cassette (3 cassette positions); 3 axis robotic; Pick & Place system[2] | — |
| Turbo pumps | Edwards STP 1003C for Source; Pfeiffer HiPace 300 + Pfeiffer TPH 1201 P for Beam Line[2] | — |
| Rough pumps | Adixen A 103 P for Source; Adixen A 103 P for Beam Line; Alcatel/Adixen ADS 602 P for End Station[2] | — |
| Clamp type | Electrostatic clamp[2] | — |
| Software | SPARC V[2] | — |
| Soft | SPARC V[2] | — |
| Non-functional modules | PC remote[2] | — |
| Configuration (160 XP Ion variant) | — | 150mm High Current IMP[1] |
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