Waferpedia

Comparison ledger

GSD HE High Energyversus160 XP

Axcelis GSD HE High Energy, Varian 160 XP, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
160 XPVarian
OEMAxcelisVarian
CategoryIon ImplantationIon Implantation
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyAxcelis GSD HE High EnergyVarian 160 XP
Cited variants—
Specifications
Wafer Size8 inch[2]—
Manufacturing Year2000[3]—
Configuration (160 XP Ion variant)—150mm High Current IMP[1]

Plan your fab

Building a Ion Implantation process? Get a complete equipment list.

Open the fab equipment planner →
Sources (3)Every fact above is drawn from these public sources
  1. [1]waferpedia.comwaferpedia.com
  2. [2]Equipment inventory listing
  3. [3]limitekltd.comlimitekltd.com