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Comparison ledger

17099370 Outer strike plateversusGSD 200 E 2 Ion

Axcelis 17099370 Outer strike plate, Axcelis GSD 200 E 2 Ion, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
OEMAxcelisAxcelis
CategoryIon ImplantationIon Implantation
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyAxcelis 17099370 Outer strike plateAxcelis GSD 200
Specifications
ConfigurationUsed with Axcelis GSD 200[1]Software Version 6.12.3[2]
High Current—GSD-200EE[2]
Ion Source Type—ELS[2]
Source Material Type—Moly[2]
Single Stage Extraction—90keV[2]
Beamline Version—Standard[2]
Source Turbo Pump (P1)—STP H2000C[2]
Beam Line Cryo Pump (P3)—CTI Onboard 10[2]
End Station Cryo Pump (P2)—CTI Onboard 8[2]
Manufacturer—Axcelis[2]
Model—GSD 200 E 2[2]
Category—Ion Implantation[3]
Wafer size—6 inch[2]
Software version—6.12.3[2]
GEM/SECS interface—Present[2]
Cassette capability—4-cassette capability[2]
Automated beam tuning and set-up—w/Eaton Autotune[2]
Energy range—90KeV[2]
Beamline and source pumps—Beamline and Source Pumps[3]
Gas Type—MFC Type and Model[2]
Ar—UNIT 1662 10SCCM - SDS[2]
BF3—UNIT 1662 10SCCM - SDS[2]
AsH3—UNIT 1662 10SCCM - SDS[2]
PH3—UNIT 1660 10SCCM - SDS[2]
External Facilities Connections—Ar N2[2]
Cryo Compressors—CTI 9600 (1)[2]
Remote Disk Chiller—SMC-HRS050[2]

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Sources (3)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]inventory listing
  3. [3]waferpedia.comwaferpedia.com