Comparison ledger
ASML Twinscan XT 1250 D ArF, SUSS MicroTec 150 e Mask, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 150 e MaskSUSS MicroTec | |
|---|---|---|
| OEM | ASML | SUSS MicroTec |
| Category | Lithography | Lithography |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | ASML Twinscan XT 1250 | SUSS MicroTec 150 e Mask |
| Specifications | ||
| Configuration | 193 nm[1] | — |
| Exposure wavelength | 193 nm[1] | — |
| Exposure source type | ArF excimer laser[1] | — |
| Category | Lithography[2] | — |
| Family | ASML Twinscan XT 1250[3] | — |
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