Comparison ledger
ASML TWINSCAN NXE:3100, Ultratech 1000 Family, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 1000 FamilyUltratech | |
|---|---|---|
| OEM | ASML | Ultratech |
| Category | Lithography | Lithography |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | 2010 | — |
| Production run | — | — |
| Lifecycle | Pre-production | — |
| Lifecycle milestones | 2010 First shipment (pre-production) | — |
| Control system | — | — |
| Generation | — | — |
| Family | ASML TWINSCAN NXE:3100 | Ultratech 1000 Family |
| Specifications | ||
| Status | Pre-production[1] | — |
| Light source wavelength | 13.5 nm (EUV)[1] | — |
| Numerical aperture (NA) | 0.33[1] | — |
| Resolution | 13 nm[1] | — |
| Tool type | — | Photolithography step-and-repeat 1X stepper[2] |
| Optical design | — | Wynne Dyson[2] |
| Magnification | — | 1X[2] |
Plan your fab
Building a Lithography process? Get a complete equipment list.
Open the fab equipment planner →