Waferpedia

Comparison ledger

PLADversus160 XP Ion

Applied Materials PLAD, Varian 160 XP Ion, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
PLADApplied Materials
OEMApplied MaterialsVarian
CategoryIon ImplantationIon Implantation
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials PLADVarian 160 XP Ion
Specifications
ManufacturerApplied Materials[1]—
ModelPLAD[1]160 XP Ion[4]
CategoryIon Implantation[1]Ion Implantation[3]
Tool typePlasma Doping Ion Implanter[2]ion implanter[3]
Wafer size300 mm[2]—
Configuration—150mm High Current IMP[3]
OEM—Varian[4]

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Sources (4)Every fact above is drawn from these public sources
  1. [1]waferpedia.comwaferpedia.com
  2. [2]fabsurplus.comfabsurplus.com
  3. [3]waferpedia.comwaferpedia.com
  4. [4]Equipment inventory listing