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Comparison ledger

Centura Enabler 300 Dryversus1512e

Applied Materials Centura Enabler 300 Dry, Tegal 1512e, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
Centura Enabler 300 DryApplied Materials
1512eTegal
OEMApplied MaterialsTegal
CategoryEtchEtch
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials Centura Enabler 300 DryTegal 1512e
Specifications
OEMApplied Materials[1]—
ModelCentura Enabler 300[1]—
Equipment typeDry Etcher[1]—
Wafer sizes12 inch[1]—
Vintage2004[1]—
Tool type—Industrial RIE plasma etcher system[2]
Stated configuration—With modules assembly for CI-4222[2]

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Sources (2)Every fact above is drawn from these public sources
  1. [1]Equipment inventory listing
  2. [2]semistarcorp.comsemistarcorp.com