Waferpedia

Comparison ledger

0020 18455 PartversusEi 5

Applied Materials 0020 18455 Part, Ulvac Ei 5, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0020 18455 PartApplied Materials
Ei 5Ulvac
OEMApplied MaterialsUlvac
CategoryDepositionDeposition
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials 0020 18455 PartUlvac Ei 5
Specifications
ConfigurationShaft,Rf In Local Match, Hdpcvd,Rev3[1]—
EB source—ULVAC EGO-40M+Power supply EPS-1000F 10kW x1 set[2]
Resistance heating evaporation source—6.8kW 3 sets[2]
Main vacuum pump—ULVAV CRYO-U16P+C30VR X1[2]
Assisted pump—Mechanical pump ULVAC EC803[2]
Deposition controller—ULVAC CRTM-9000[2]
Vacuum gauge—ULVAC G-TRAN BMR2 ULVAC G-TRAN BRP2,SP1[2]
Deposition history—Au, PT, Ti[2]
Substrate rotation—Revolving flat plate type[2]
Substrate heating—None[2]
Lamp heater—6 kW x 4 sets[3]

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Sources (3)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]inventory listing
  3. [3]inventory listing