Waferpedia

Comparison ledger

0020 18455 PartversusProducer GT HARP

Applied Materials 0020 18455 Part, Applied Materials Producer GT HARP, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0020 18455 PartApplied Materials
Producer GT HARPApplied Materials
OEMApplied MaterialsApplied Materials
CategoryDepositionDeposition
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials 0020 18455 PartApplied Materials Producer
Specifications
ConfigurationShaft,Rf In Local Match, Hdpcvd,Rev3[1]SACVD HARP Chamber[2]
Process—SACVD HARP[2]
Deposition Material—USG (undoped silicate glass)[3]
Wafer Size—300 mm[3]
Vintage—2008-05-31[3]
Make—Applied Materials[2]
Model—Producer GT HARP[2]
Chamber Type—SACVD HARP Chamber[2]
Chamber Configuration—3 Twin chamber[3]
Process type—SACVD HARP Chamber[2]
Manufacturer—Applied Materials[2]
Process type (detail)—HARP USG Process[3]
Chamber configuration—3 twin chambers[3]
Wafer version—300 mm[3]

Plan your fab

Building a Deposition process? Get a complete equipment list.

Open the fab equipment planner →
Sources (3)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]inventory listing
  3. [3]fabsurplus.comfabsurplus.com