Comparison ledger
Applied Materials 0010 47763, Lam Research 4520, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010 47763Applied Materials | 4520Lam Research |
|---|---|---|
| OEM | Applied Materials | Lam Research |
| Category | Etch | Etch |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010 47763 | Lam Research Rainbow 4520 |
| Cited variants | — |
|
| Specifications | ||
| Configuration | 2nd Source New[2] | Envision Software[5] |
| Type | Monopolar Dual Heated[3] | etcher[6] |
| Description | ASSY, ESC, BONDED, MONOPOLAR DUAL HEATED[4] | — |
| Possible Materials | Al2O3 (aluminum oxide) or AlN (aluminum nitride)[3] | — |
| Model | 0010-47763[2] | — |
| OEM | Applied Materials[2] | — |
| Material (possible) | Al2O3 (aluminum oxide) or AlN (aluminum nitride)[3] | — |
| Application | Fixing wafers in etching process (PVD, CVD, ETCH)[3] | — |
| Quantity available (source) | 1[3] | — |
| Main Chamber | — | Top actuate clamping system[6] |
| Category | — | Etch[6] |
| System description | — | TCP oxide etch system[7] |
| Wafer size | — | 200 mm[7] |
| Software | — | Envision 1.52[7] |
| Wafer handling | — | Hine cassette indexer load / unload[6] |
| Loadlock | — | Entrance loadlock[6] |
| System type | — | single wafer, vacuum load-locked low pressure oxide etch system[1] |
| Load / unload | — | Hine cassette indexer load / unload[6] |
| Remote panel | — | Remote AC Panel[6] |
| Endpoint | — | Monochrometer[7] |
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