Waferpedia

Comparison ledger

0010-22161 High EFF RF Matchversus911-5039

Applied Materials 0010-22161 High EFF RF Match, Varian 911-5039, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
911-5039Varian
OEMApplied MaterialsVarian
Category——
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials 0010-22161 High EFF RF MatchVarian 911-5039
Specifications
MakeApplied Materials[1]—
Model0010-22161[1]—
DescriptionHTESC PH 1 REV A[2]—
ConditionUsed[2]—
Stock NumberBM6628[2]—
Configuration—60L Ion Pump w/ Magnet[3]
Type—60L Ion Pump w/ Magnet[3]
Voltage—100V[3]
Power—500W[3]
Intended Use—For Hitachi SEM S-4200, S-4500[3]
Sources (3)Every fact above is drawn from these public sources
  1. [1]Equipment inventory listing
  2. [2]tarasemi.comtarasemi.com
  3. [3]inventory listing