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0010-22161 High EFF RF MatchversusUH 104 12 UV

Applied Materials 0010-22161 High EFF RF Match, Ultron UH 104 12 UV, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
OEMApplied MaterialsUltron
Category——
Wafer size——
Process node——
Introduced——
Production run——
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Control system——
Generation——
FamilyApplied Materials 0010-22161 High EFF RF MatchUltron UH 104 12 UV
Cited variants—
Specifications
MakeApplied Materials[2]Ultron[4]
Model0010-22161[2]UH 104 12[4]
DescriptionHTESC PH 1 REV A[3]—
ConditionUsed[3]—
Stock NumberBM6628[3]—
System type—UV curing system[4]
Line designation—UH104-8/UH104-12[1]
Curing process—Cool, low-temperature UVA 365nm[1]
UV lamp—Environmentally safe, ozone-free UV lamp array[1]
Wafer capacity—Up to 300mm frame-mounted wafer[1]
Controller—Easily programmable microprocessor-based controller[1]
Operation—Repeatable, reliable, single-frame, manual operation[1]
Workstage—Optional motorized, rotating workstage[1]
Dimensions (UH104-12 height)—11-1/8"[1]
Dimensions (UH104-12 width)—25-1/8"[1]
Dimensions (UH104-12 depth)—25-3/16"[1]
Sources (4)Every fact above is drawn from these public sources
  1. [1]ultronsystems.comultronsystems.com
  2. [2]Equipment inventory listing
  3. [3]tarasemi.comtarasemi.com
  4. [4]Equipment inventory listing