Comparison ledger
Applied Materials 0010-22161 High EFF RF Match, Tokyo Electron 8 SE, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-22161 High EFF RF MatchApplied Materials | 8 SETokyo Electron |
|---|---|---|
| OEM | Applied Materials | Tokyo Electron |
| Category | — | — |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010-22161 High EFF RF Match | Tokyo Electron 8 SE |
| Specifications | ||
| Make | Applied Materials[1] | — |
| Model | 0010-22161[1] | 8 SE[3] |
| Description | HTESC PH 1 REV A[2] | — |
| Condition | Used[2] | — |
| Stock Number | BM6628[2] | — |
| Configuration | — | High Temperature, Oxide[3] |
| OEM | — | Tokyo Electron[3] |
| Wafer size | — | 8 inch[3] |
| System description | — | High Temperature, Oxide[3] |
| Temperature range / max | — | 1200~1250*C[3] |
| Process | — | Wet Ox, can be used as Dry Ox[3] |
| Product family | — | TELFORMULA Alpha 303i / ATP Alpha 8-SE / ATP[4] |
| Footprint | — | Smallest footprint worldwide; 1100 mm wide[4] |
| Control | — | Equipped with proven ART (Adaptive Realtime Temperature) Control[4] |
| Productivity | — | High productivity powered by thermo plug[4] |
| Supported Wafer Size | — | 8 inch[3] |
| Process Type | — | High Temperature Oxide, Wet Oxidation, Dry Oxidation[3] |
| Maximum Temperature Range | — | 1200~1250 °C[3] |
| Product Series | — | ALPHA-303i series[4] |
| Machine Footprint Width | — | 1100 mm[4] |
| Temperature Control | — | ART (Adaptive Realtime Temperature) Control[4] |
| Compliance | — | JG/SEMI Standards[4] |
| Temperature range | — | 1200~1250°C[3] |
| Process type | — | High temperature oxide processing[3] |
| Oxidation type | — | Wet or dry oxidation[3] |