Comparison ledger
Applied Materials 0010-22161 High EFF RF Match, STS 320, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-22161 High EFF RF MatchApplied Materials | 320STS |
|---|---|---|
| OEM | Applied Materials | STS |
| Category | — | — |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010-22161 High EFF RF Match | STS 320 |
| Specifications | ||
| Make | Applied Materials[1] | — |
| Model | 0010-22161[1] | — |
| Description | HTESC PH 1 REV A[2] | — |
| Condition | Used[2] | — |
| Stock Number | BM6628[2] | — |
| Reactive Ion Etch Type | — | Parallel-plate RIE[3] |
| RF Frequency | — | 13.56 MHz[3] |
| Driven Electrode Area | — | 900 cm²[3] |
| Process Gases | — | SF6, SF6+O2, CF4, CF4+O2[3] |
| Pressure (typical) | — | 55 mtorr[3] |