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Comparison ledger

0010-22161 High EFF RF MatchversusMP 200 XCU

Applied Materials 0010-22161 High EFF RF Match, Onto Innovation MP 200 XCU, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
MP 200 XCUOnto Innovation
OEMApplied MaterialsOnto Innovation
Category——
Wafer size——
Process node——
Introduced——
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FamilyApplied Materials 0010-22161 High EFF RF MatchOnto Innovation MP 200 XCU
Specifications
MakeApplied Materials[1]—
Model0010-22161[1]MP 200 XCU[3]
DescriptionHTESC PH 1 REV A[2]—
ConditionUsed[2]—
Stock NumberBM6628[2]—
Wafer Size—8 inch[3]
Manufacturer—Onto Innovation[4]
Tool type—wafer measurement tool[4]
Measurement—copper film thickness[5]
Sources (5)Every fact above is drawn from these public sources
  1. [1]Equipment inventory listing
  2. [2]tarasemi.comtarasemi.com
  3. [3]Equipment inventory listing
  4. [4]waferpedia.comwaferpedia.com
  5. [5]waferpedia.comwaferpedia.com