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0010-22161 High EFF RF MatchversusApogee 450 Spin

Applied Materials 0010-22161 High EFF RF Match, CEE Apogee 450 Spin, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
OEMApplied MaterialsCEE
Category——
Wafer size——
Process node——
Introduced——
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FamilyApplied Materials 0010-22161 High EFF RF MatchCEE Apogee
Specifications
MakeApplied Materials[1]—
Model0010-22161[1]Apogee 450[3]
DescriptionHTESC PH 1 REV A[2]—
ConditionUsed[2]—
Stock NumberBM6628[2]—
Configuration—208-240 V[3]
Equipment type—Spin coater[3]
Wafer sizes—6, 8, 12 inch[3]
Max substrate size—450 mm round or 14" x 14" square[4]
Max spin speed—6,000 rpm[4]
Max acceleration—30,000 rpm/s[4]
Spin speed repeatability—0.2 rpm[4]
Acceleration resolution—< 0.2 rpm/s[4]
Spin speed resolution—0.2 rpm[4]
GUI—7-inch full-color touchscreen[4]
Number of recipes—Unlimited[4]
Step time resolution—0.1 s[4]
Weight—85 lb (38.6 kg)[4]
Voltage—208-230 VAC[4]
Drain port—3/4" OD[4]
Full load current—6A (max)[4]
Exhaust port—1.5" OD, 0.4” H2O @ 30 CFM (100 Pa @ 50 CMH)[4]
Vacuum—1/4" push to connect, <33 kPa abs[4]
Automated dispense gas—N2/CDA, 70 psi (482 kPa)[4]
Interface—USB 2.0, Ethernet, StreamSync™ communication protocol[5]
Chamber material—HDPE spin bowl[5]
Vacuum and lid interlock—Yes[5]
Sources (5)Every fact above is drawn from these public sources
  1. [1]Equipment inventory listing
  2. [2]tarasemi.comtarasemi.com
  3. [3]inventory listing
  4. [4]costeffectiveequipment.comcosteffectiveequipment.com
  5. [5]instrumenthive.cominstrumenthive.com