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Comparison ledger

0010-22161 High EFF RF Matchversus100 Spinner

Applied Materials 0010-22161 High EFF RF Match, CEE 100 Spinner, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
OEMApplied MaterialsCEE
Category——
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials 0010-22161 High EFF RF MatchCEE 100 Spinner
Specifications
MakeApplied Materials[1]—
Model0010-22161[1]—
DescriptionHTESC PH 1 REV A[2]—
ConditionUsed[2]—
Stock NumberBM6628[2]—
Spin Speed Range—1 to 6000 RPM[3]
Acceleration Range—1 to 30000 RPM/s[3]
Step Time Range—1 to 999 seconds[3]
Programmable Presets—10[4]
Steps per Program—Up to 10 steps[4]
Wafer Size—Up to 6 inches (152.4 mm)[4]
Available Spin Chucks—2.25 inches (57.2 mm) and 0.3125 inches (7.9 mm)[3]
Sources (4)Every fact above is drawn from these public sources
  1. [1]Equipment inventory listing
  2. [2]tarasemi.comtarasemi.com
  3. [3]nanofab.ku.edunanofab.ku.edu
  4. [4]nanofab.utah.edunanofab.utah.edu