Comparison ledger
Applied Materials 0010-22161 High EFF RF Match, Applied Materials 9500 XR 200 S, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-22161 High EFF RF MatchApplied Materials | 9500 XR 200 SApplied Materials |
|---|---|---|
| OEM | Applied Materials | Applied Materials |
| Category | — | — |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010-22161 High EFF RF Match | Applied Materials PI 9500 |
| Specifications | ||
| Make | Applied Materials[1] | — |
| Model | 0010-22161[1] | — |
| Description | HTESC PH 1 REV A[2] | — |
| Condition | Used[2] | — |
| Stock Number | BM6628[2] | — |
| Phase | — | 3 Phase + Neutral[3] |
| Configuration | — | 50/60 Hz[3] |
| Voltage | — | 208 V[3] |
| CPU | — | MVME162-P244LSE[3] |
| Software | — | 4.06[3] |
| BF3 | — | SDS[3] |
| PH3 | — | SDS[3] |
| AsH3 | — | SDS[3] |
| SiF4 | — | SDS[3] |
| Argon | — | External Feed[3] |
| Chamber | — | CT-10 Cryos[3] |
| Source Turbo | — | STP-1000C[3] |
| Mrs Turbo | — | STP-361C[3] |
| Source Backing | — | QDP40[3] |
| Wafer Loader | — | QDP80 w/ EH500 Blower[3] |
| Source Type | — | IHC[3] |
| Oven Capabilities | — | Oven fitted to source[3] |
| Wafer Sizes | — | 6 inch[3] |
| Power | — | 3 Phase + Neutral - 50/60 Hz - 208 V[3] |
| Gas Box Gases | — | BF3: SDS, PH3: SDS, AsH3: SDS, SiF4: SDS, Argon: External Feed[3] |
| Enlarged Chamber | — | Yes[3] |
| Source Magnet | — | 40A[3] |
| Extraction | — | Dual Bellows 60kV[3] |
| Post Acell | — | 160kV max[3] |
| Total Energy | — | 200kV max[3] |
| Plasma Flood Gun | — | HDPFS[3] |
| Wheel | — | Direct Drive[3] |
| Tilt | — | 0 to 7[3] |
| Orient | — | fitted, not in use[3] |
| Flat Not Found Sensor | — | fitted, not in use[3] |
| Gripper | — | Hollow[3] |
| Wafer on Gripper Sensor | — | 2000 Vintage[3] |