Comparison ledger
Applied Materials 0010-21246 Part, Thermo Fisher Scientific FEI Helios NanoLab 600 FIB, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-21246 PartApplied Materials | Scientific FEI Helios NanoLab 600 FIBThermo Fisher |
|---|---|---|
| OEM | Applied Materials | Thermo Fisher |
| Category | — | — |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | — | Thermo Fisher Scientific FEI Helios NanoLab 600 FIB |
| Specifications | ||
| Configuration | — | Dual beam[1] |
| Sample stage | — | 5-Axes motorized X-Y-Z-rotate-tilt stage[1] |
| Step size | — | 100 nm (Minimum)[1] |
| High vacuum | — | 10^-10 mbar[1] |
| X, Y-Axis | — | 150 mm[1] |
| Z-Axis | — | 10 mm[1] |
| Tilt range | — | -5° to +60°[1] |
| Source | — | SCHOTTKY Field emitter[1] |
| Accelerating voltage | — | 350 V to 30 kV (Continuously adjustable)[1] |
| Beam current | — | 1 pA - 22 nA[1] |
| Type | — | Dual beam[1] |
| Vacuum system | — | Edwards XDS10 Scroll pump[1] |
| Travel X, Y-Axis | — | 150 mm[1] |
| Travel Z-Axis | — | 10 mm[1] |
| Repeatability | — | 1 µm at 0°; 2 µ at 52°[1] |
| Electron source | — | SCHOTTKY Field emitter[1] |
| Electron accelerating voltage | — | 350 V to 30 kV (Continuously adjustable)[1] |
| Electron beam current | — | 1 pA - 22 nA[1] |
| Electron resolution | — | 0.9 nm at 15 kV; 1.4 nm at 1 kV[1] |
| Ion source | — | Liquid Gallium ion emitter[1] |
| Ion optics | — | Sidewinder Field emission focused ion beam optics[1] |
| Ion accelerating voltage | — | 0.5 kV to 30 kV (Continuously adjustable)[1] |
| Ion beam current | — | 1.5 pA - 20 nA[1] |
| Ion imaging resolution | — | 5 nm at 30 kV[1] |
| Ion milling resolution | — | 10 nn on Cr thin film[1] |
| Scanner resolutions | — | 512x442, 1024x884, 2048x1768, 4096x3536 pixels[1] |
| Minimum dwell time | — | 25 ns/pixel[1] |
| Patterning maximum resolution | — | 64k x 64k[1] |
| Patterning maximum dwell | — | 25 ms/pixel[1] |
| Detectors | — | In-lens SE and BSE True Lens Detector (TLD); Everhart-Thornely SE Detector (ETD); 14-Segments solid state STEM II detector; Chamber viewing IR CCD camera[1] |
| Controller | — | Microscope controller; LCD Monitor, 19"; Screen resolution 1280x1024; Optical mouse; Chamber door mounted interface for manipulators[1] |
| Imaging resolution | — | 5 nm at 30 kV[1] |
| Milling resolution | — | 10 nn on Cr thin film[1] |
| Resolution | — | 512x442, 1024x884, 2048x1768, 4096x3536 pixels[1] |
| Maximum resolution | — | 64k x 64k[1] |
| Minimum dwell | — | 25 ns/pixel[1] |
| Maximum dwell | — | 25 ms/pixel[1] |
| Screen resolution | — | 1280x1024[1] |
| Instrument type | — | Dual beam focused ion beam (FIB)[1] |
| Stage | — | 5-axis motorized X-Y-Z-rotate-tilt stage[1] |
| Stage travel X/Y | — | 150 mm[3] |
| Stage travel Z | — | 10 mm[1] |
| Vacuum pump | — | Edwards XDS10 scroll pump[1] |
| Sample stage step size | — | 100 nm minimum[1] |
| Maximum dwell time | — | 25 ms/pixel[1] |
| Additional included item | — | Broad beam plasma source ion column (focus 250 µm)[1] |
| Included documentation | — | Manuals included[1] |
| Manipulator | — | Does not include manipulator[1] |
| Stage control | — | 5 axes motorized XYZRT 6 in UHR stage with piezo control[3] |
| Magnification | — | 69x to 2,300,000x[3] |
| Detector | — | Through-lens detection for SE and BSE[3] |
| STEM detector | — | Retractable[3] |
| Stage tilt | — | -10° to +60°[3] |
| Optional accessories | — | Omniprobe Autoprobe 200; Ibss Group GV10x plasma cleaner[3] |