Waferpedia

Comparison ledger

0010-16392 ESC AssemblyversusMXP Multiplex ICP

Applied Materials 0010-16392 ESC Assembly, STS MXP Multiplex ICP, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0010-16392 ESC AssemblyApplied Materials
OEMApplied MaterialsSTS
CategoryEtchEtch
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials 0010-16392 ESC AssemblySTS MXP Multiplex ICP
Specifications
OEMApplied Materials[1]STS[3]
Model0010-16392[1]MXP Multiplex ICP[3]
TypeESC Assembly[1]—
Wafer Size300 mm[2]—
Electrode ConfigurationDual[2]—
Configuration—Plasma Etcher[3]
Tool type—Inductively coupled plasma etcher[4]
Category—Etch[5]
Process—Plasma etching[4]

Plan your fab

Building a Etch process? Get a complete equipment list.

Open the fab equipment planner →
Sources (5)Every fact above is drawn from these public sources
  1. [1]Equipment inventory listing
  2. [2]spwindustrial.comspwindustrial.com
  3. [3]inventory listing
  4. [4]waferpedia.comwaferpedia.com
  5. [5]waferpedia.comwaferpedia.com