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Comparison ledger

0010-16392 ESC AssemblyversusPlasmalab 100 RIE

Applied Materials 0010-16392 ESC Assembly, Oxford Instruments Plasmalab 100 RIE, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0010-16392 ESC AssemblyApplied Materials
Plasmalab 100 RIEOxford Instruments
OEMApplied MaterialsOxford Instruments
CategoryEtchEtch
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials 0010-16392 ESC AssemblyOxford Instruments Plasmalab 100
Cited variants—
  • Plasmalab 100 Plus[1]
  • Plasmalab 100 RIE (FL)[2]
Specifications
OEMApplied Materials[3]—
Model0010-16392[3]—
TypeESC Assembly[3]—
Wafer Size300 mm[4]6 inch[5]
Electrode ConfigurationDual[4]—
Voltage—208V, 50/60Hz[5]
Configuration—With VAT PM-5 Adaptive Pressure Controller[5]
RF Generator—Advanced Energy RFX 600A, 600 W @ 13.56 MHz[2]
Electrode Temperature Range—10°C to 80°C[2]
Turbo Pump—Alcatel ATH 400M[2]
Turbo Pump Controller—Alcatel ACT 600M[2]
Pressure Controller—VAT PM-5 Adaptive Pressure Controller[5]
Number of Gas Lines—6 (with MFCs)[2]
Installed Gases—Ar, N2, CHF3, NF3, N2O[2]
Chiller—Thermo Neslab RTE7 Chiller and OptiTemp OTI-5WL-P3-216 Chiller[5]
Vacuum Pump—Leybold D65BCS Vacuum Pump with oil filter and exhaust filter[5]
Control System—Windows PC with user-friendly interface and blue PLC control architecture[2]
Platen Size—330 mm platen[2]
Load-locked—Yes[1]

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Sources (5)Every fact above is drawn from these public sources
  1. [1]classoneequipment.comclassoneequipment.com
  2. [2]semistarcorp.comsemistarcorp.com
  3. [3]Equipment inventory listing
  4. [4]spwindustrial.comspwindustrial.com
  5. [5]inventory listing