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Comparison ledger

0010-16392 ESC AssemblyversusCentura AP eMax CT+

Applied Materials 0010-16392 ESC Assembly, Applied Materials Centura AP eMax CT+, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0010-16392 ESC AssemblyApplied Materials
Centura AP eMax CT+Applied Materials
OEMApplied MaterialsApplied Materials
CategoryEtchEtch
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials 0010-16392 ESC AssemblyApplied Materials Centura AP eMax CT+
Specifications
OEMApplied Materials[1]—
Model0010-16392[1]Centura AP eMax CT+[5]
TypeESC Assembly[1]—
Wafer Size300 mm[2]—
Electrode ConfigurationDual[2]—
Wafer size—300 mm[3]
Chamber configuration—3 chambers[3]
Vintage year—2007[4]
Process type—Oxide etch[3]
Manufacturer—Applied Materials[5]
Tool type—Etcher[5]
Application—Semiconductor manufacturing[4]
Vintage—01.06.2007[3]

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Sources (5)Every fact above is drawn from these public sources
  1. [1]Equipment inventory listing
  2. [2]spwindustrial.comspwindustrial.com
  3. [3]fabsurplus.comfabsurplus.com
  4. [4]waferpedia.comwaferpedia.com
  5. [5]Equipment inventory listing