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Comparison ledger

0010-13622 RF Match forversus3118

Applied Materials 0010-13622 RF Match for, Varian 3118, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0010-13622 RF Match forApplied Materials
3118Varian
OEMApplied MaterialsVarian
CategoryDepositionDeposition
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials 0010-13622 RF Match forVarian 3118
Cited variants—
  • 3118 10 E E-Beam[1]
Specifications
ConfigurationHigh Efficiency HE RF Match-Bias[2]—
Model0010-13622[2]3118[3]
Product TypeRF Match for PVD (Physical Vapor Deposition)[2]—
FeatureHigh Efficiency HE RF Match-Bias[2]—
System Type—Electron beam evaporator thin film deposition system[3]
OEM—Varian[3]
High Voltage Power Supply—Edwards Temescal CV-GSLX[3]
Beam Controller—Temescal beam controller with remote[3]
Heater Power Supplies—CHA heater power supplies[3]
SCR Power Supplies—Varian SCR power supplies[3]
Vacuum Pump—Pfeiffer Adixen ACP 28 dry vacuum pump (not included)[3]
Cryogenic Pumping—CTI Cryogenics cryo compressor[3]
Chiller—Neslab ThermoFlex 2500 (not included)[3]
Substrate Configuration—Slot rotating substrate holder with planetary shields[3]

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Sources (3)Every fact above is drawn from these public sources
  1. [1]waferpedia.comwaferpedia.com
  2. [2]inventory listing
  3. [3]semistarcorp.comsemistarcorp.com