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Comparison ledger

0010-13622 RF Match forversusConcept Two Speed NExT

Applied Materials 0010-13622 RF Match for, Lam Research Concept Two Speed NExT, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0010-13622 RF Match forApplied Materials
OEMApplied MaterialsLam Research
CategoryDepositionDeposition
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials 0010-13622 RF Match forLam Research Concept Two
Specifications
ConfigurationHigh Efficiency HE RF Match-Bias[1]—
Model0010-13622[1]—
Product TypeRF Match for PVD (Physical Vapor Deposition)[1]—
FeatureHigh Efficiency HE RF Match-Bias[1]—
Wafer Shape—Notch[2]
SMIF Interface—Yes[2]
Cassette Loader—LPI 2200[2]
Loadlock Indexer Robot—Indexer II[2]
PEC slot—MPS with one cool station[2]
Main power distributer—PDP[2]
System Main Power—3¢5Wires 208V[2]
System UPS Power—Yes[2]
Loadlock Baratron Model—MKS[2]
Split Insert—Yes[2]
Slit Valve Type—SMC L-Motion[2]
TM Turbo Pump Model—Pfeiffer TC 400 E74[2]
TM Throttle Valve Model—MKS[2]
TM Baratron Model—MKS[2]
IOC Version—V 4.4[2]
TM Robot Type—Mag 7 with Center Finder[2]
TMRobot Blade—Metal[2]
Wafer sensor—Existence[2]
EMO's—Push Button/turn to release[2]
Front Monitor—15 inch[2]

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Sources (2)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]inventory listing