Comparison ledger
Applied Materials 0010-13622 RF Match for, CHA Mark 50 C Vacuum, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-13622 RF Match forApplied Materials | |
|---|---|---|
| OEM | Applied Materials | CHA |
| Category | Deposition | Deposition |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010-13622 RF Match for | CHA Mark 50 C Vacuum |
| Specifications | ||
| Configuration | High Efficiency HE RF Match-Bias[1] | — |
| Model | 0010-13622[1] | — |
| Product Type | RF Match for PVD (Physical Vapor Deposition)[1] | — |
| Feature | High Efficiency HE RF Match-Bias[1] | — |
| Phase | — | 3 Phase, 208 VAC, 50/60 Hz, 150 A[2] |
| Water | — | 9.25 GPM[2] |
| Air | — | 90-100 Psi[2] |
| Dry Pump | — | Edwards CDP 80[2] |
| Compressor #1 | — | CTI 9600[2] |
| Compressor #2 | — | CTI 9600[2] |
| Power Supply | — | CHA SR 10 D 212[2] |
| P/N | — | 8112835 G 001[2] |
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