Comparison ledger
Applied Materials 0010-03485 Magnet Assy, Tokyo Electron 8 SE, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-03485 Magnet AssyApplied Materials | 8 SETokyo Electron |
|---|---|---|
| OEM | Applied Materials | Tokyo Electron |
| Category | — | — |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010-03485 Magnet Assy | Tokyo Electron 8 SE |
| Specifications | ||
| Configuration | WP AL 300mm PVD[1] | High Temperature, Oxide[5] |
| OEM | Applied Materials[1] | Tokyo Electron[5] |
| Model | 0010-03485[1] | 8 SE[5] |
| Description | MAGNET ASSY, WP AL 300MM PVD[2] | — |
| Process | PVD[3] | Wet Ox, can be used as Dry Ox[5] |
| Wafer size | 300mm[4] | 8 inch[5] |
| Version | Spares[4] | — |
| Part Number | 0010-03485[1] | — |
| Manufacturer | Applied Materials[1] | — |
| Process Type | PVD (Physical Vapor Deposition)[1] | High Temperature Oxide, Wet Oxidation, Dry Oxidation[5] |
| Application (Material) | Aluminum (AL)[1] | — |
| Wafer Diameter (associated) | 300 mm[1] | — |
| System description | — | High Temperature, Oxide[5] |
| Temperature range / max | — | 1200~1250*C[5] |
| Product family | — | TELFORMULA Alpha 303i / ATP Alpha 8-SE / ATP[6] |
| Footprint | — | Smallest footprint worldwide; 1100 mm wide[6] |
| Control | — | Equipped with proven ART (Adaptive Realtime Temperature) Control[6] |
| Productivity | — | High productivity powered by thermo plug[6] |
| Supported Wafer Size | — | 8 inch[5] |
| Maximum Temperature Range | — | 1200~1250 °C[5] |
| Product Series | — | ALPHA-303i series[6] |
| Machine Footprint Width | — | 1100 mm[6] |
| Temperature Control | — | ART (Adaptive Realtime Temperature) Control[6] |
| Compliance | — | JG/SEMI Standards[6] |
| Temperature range | — | 1200~1250°C[5] |
| Process type | — | High temperature oxide processing[5] |
| Oxidation type | — | Wet or dry oxidation[5] |