Comparison ledger
Applied Materials 0010-03485 Magnet Assy, STS 320, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-03485 Magnet AssyApplied Materials | 320STS |
|---|---|---|
| OEM | Applied Materials | STS |
| Category | — | — |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010-03485 Magnet Assy | STS 320 |
| Specifications | ||
| Configuration | WP AL 300mm PVD[1] | — |
| OEM | Applied Materials[1] | — |
| Model | 0010-03485[1] | — |
| Description | MAGNET ASSY, WP AL 300MM PVD[2] | — |
| Process | PVD[3] | — |
| Wafer size | 300mm[4] | — |
| Version | Spares[4] | — |
| Part Number | 0010-03485[1] | — |
| Manufacturer | Applied Materials[1] | — |
| Process Type | PVD (Physical Vapor Deposition)[1] | — |
| Application (Material) | Aluminum (AL)[1] | — |
| Wafer Diameter (associated) | 300 mm[1] | — |
| Reactive Ion Etch Type | — | Parallel-plate RIE[5] |
| RF Frequency | — | 13.56 MHz[5] |
| Driven Electrode Area | — | 900 cm²[5] |
| Process Gases | — | SF6, SF6+O2, CF4, CF4+O2[5] |
| Pressure (typical) | — | 55 mtorr[5] |