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0010-03485 Magnet AssyversusAlcatel ADP 122 P Dry Vacuum

Applied Materials 0010-03485 Magnet Assy, Pfeiffer Alcatel ADP 122 P Dry Vacuum, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0010-03485 Magnet AssyApplied Materials
OEMApplied MaterialsPfeiffer
Category——
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials 0010-03485 Magnet AssyPfeiffer Alcatel ADP 122
Specifications
ConfigurationWP AL 300mm PVD[1]208/480V[5]
OEMApplied Materials[1]—
Model0010-03485[1]ADP 122 P[5]
DescriptionMAGNET ASSY, WP AL 300MM PVD[2]—
ProcessPVD[3]—
Wafer size300mm[4]—
VersionSpares[4]—
Part Number0010-03485[1]—
ManufacturerApplied Materials[1]—
Process TypePVD (Physical Vapor Deposition)[1]—
Application (Material)Aluminum (AL)[1]—
Wafer Diameter (associated)300 mm[1]—
Phase—3 Phase[5]
Option—Edition 04[5]
Oil type—Fomblin[5]
Make—Pfeiffer / Alcatel[5]
Equipment type—Dry Vacuum Pump[5]
Power—208/480V[5]
Condition—Pump powers on and runs[5]
Current wiring—Currently wired for 208V[5]
Service date—Fully serviced and certified 01/2021[5]
Pumping speed at 50 Hz—95 m3/h[6]
Pumping speed at 60 Hz—112 m3/h[6]
Water cooling flow—1.5 l/h[6]
Ultimate pressure at 50 Hz—3 x 10 -2 mbar[6]
Ultimate pressure at 60 Hz—1.5 x 10 -2 mbar[6]
Inlet—NW 50[6]
Exhaust port—NW 40[6]
Weight—400 lbs[6]
Sources (6)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]semistarcorp.comsemistarcorp.com
  3. [3]layla-ec.comlayla-ec.com
  4. [4]fabsurplus.comfabsurplus.com
  5. [5]inventory listing
  6. [6]ajvs.comajvs.com