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Comparison ledger

0010-03485 Magnet AssyversusSurfscan 6200

Applied Materials 0010-03485 Magnet Assy, KLA Surfscan 6200, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0010-03485 Magnet AssyApplied Materials
OEMApplied MaterialsKLA
Category——
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
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FamilyApplied Materials 0010-03485 Magnet AssyKLA Surfscan 6200
Specifications
ConfigurationWP AL 300mm PVD[1]—
OEMApplied Materials[1]—
Model0010-03485[1]—
DescriptionMAGNET ASSY, WP AL 300MM PVD[2]—
ProcessPVD[3]—
Wafer size300mm[4]—
VersionSpares[4]—
Part Number0010-03485[1]—
ManufacturerApplied Materials[1]—
Process TypePVD (Physical Vapor Deposition)[1]—
Application (Material)Aluminum (AL)[1]—
Wafer Diameter (associated)300 mm[1]—
Wafer Sizes Supported—50mm (2"), 76mm (3"), 100mm (4"), 125mm (5"), 150mm (6"), 200mm (8")[5]
Defect Sensitivity—0.10 µm diameter PSL sphere equivalent with greater than 90% capture rate[5]
Defect Sensitivity (alternative)—0.12 µm[6]
Illumination Source—30 mW Argon-Ion laser, 488 nm wavelength[5]
Haze Sensitivity—0.02 ppm[5]
Haze Resolution—0.002 ppm[5]
Repeatability—0.5% at 1σ (mean count >500, 0.364 µm latex spheres)[5]
Accuracy—≥99% (verified with VLSI Standards)[5]
Dynamic Range—0.01 µm to 9,999 µm in a single measurement[5]
Throughput—Up to 100 w/hr using 150mm wafers[5]
Cassette Handling—Single puck wafer handling from two cassette (one sender/receiver, one receiver)[5]
Operating System / Software—Microsoft Windows 98, version 4.2[6]
Dimensions (H x W x D)—168 cm x 75 cm x 77 cm (66" x 29.5" x 30.25")[5]
Weight—240 kg (530 lbs)[5]
Sources (6)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]semistarcorp.comsemistarcorp.com
  3. [3]layla-ec.comlayla-ec.com
  4. [4]fabsurplus.comfabsurplus.com
  5. [5]semistarcorp.comsemistarcorp.com
  6. [6]classoneequipment.comclassoneequipment.com