Comparison ledger
Applied Materials 0010-03485 Magnet Assy, Espec HRS-800HS-25, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-03485 Magnet AssyApplied Materials | HRS-800HS-25Espec |
|---|---|---|
| OEM | Applied Materials | Espec |
| Category | — | — |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010-03485 Magnet Assy | Espec HRS-800HS-25 |
| Cited variants | — | |
| Specifications | ||
| Configuration | WP AL 300mm PVD[2] | — |
| OEM | Applied Materials[2] | — |
| Model | 0010-03485[2] | — |
| Description | MAGNET ASSY, WP AL 300MM PVD[3] | — |
| Process | PVD[4] | — |
| Wafer size | 300mm[5] | — |
| Version | Spares[5] | — |
| Part Number | 0010-03485[2] | — |
| Manufacturer | Applied Materials[2] | — |
| Process Type | PVD (Physical Vapor Deposition)[2] | — |
| Application (Material) | Aluminum (AL)[2] | — |
| Wafer Diameter (associated) | 300 mm[2] | — |
| Category | — | Rapid-rate thermal cycle chamber[1] |
| Temperature & humidity range | — | −70℃ to ＋180℃ / 20％rh to 98％rh[1] |
| Temperature rate of change | — | 25℃/min[1] |
| Interior dimensions | — | 1000×1000×800 mm[1] |
| Temperature range | — | -70°C to +180°C[1] |
| Humidity range | — | 20% to 98% rh[1] |
| Interior dimensions (W x H x D) | — | 1000 x 1000 x 800 mm[1] |
| Capacity | — | 800 L[6] |