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Comparison ledger

0010-03485 Magnet AssyversusIQDP 40

Applied Materials 0010-03485 Magnet Assy, Edwards IQDP 40, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0010-03485 Magnet AssyApplied Materials
IQDP 40Edwards
OEMApplied MaterialsEdwards
Category——
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials 0010-03485 Magnet AssyEdwards IQDP 40
Cited variants—
Specifications
ConfigurationWP AL 300mm PVD[2]—
OEMApplied Materials[2]—
Model0010-03485[2]—
DescriptionMAGNET ASSY, WP AL 300MM PVD[3]—
ProcessPVD[4]—
Wafer size300mm[5]—
VersionSpares[5]—
Part Number0010-03485[2]—
ManufacturerApplied Materials[2]—
Process TypePVD (Physical Vapor Deposition)[2]—
Application (Material)Aluminum (AL)[2]—
Wafer Diameter (associated)300 mm[2]—
Typical peak pumping speed (50 Hz)—44 m³ h⁻¹[6]
Typical peak pumping speed (60 Hz)—55 m³ h⁻¹[6]
Displacement (swept volume) at 50 Hz—52.0 m³ h⁻¹[6]
Displacement (swept volume) at 60 Hz—62.4 m³ h⁻¹[6]
Ultimate vacuum (with shaft-seals purge, 50 Hz)—5 × 10⁻² mbar[6]
Mass (pump only)—186 kg[6]
Motor power—2.2 kW[1]
Noise level—< 70 dB(A)[6]
Inlet connection—ISO40 bolted[7]
Exhaust connection—KF40[7]
Electrical supply—3-phase, 208-230/380-415 V, 50/60 Hz[7]
Sources (7)Every fact above is drawn from these public sources
  1. [1]scribd.comscribd.com
  2. [2]inventory listing
  3. [3]semistarcorp.comsemistarcorp.com
  4. [4]layla-ec.comlayla-ec.com
  5. [5]fabsurplus.comfabsurplus.com
  6. [6]idealvac.comidealvac.com
  7. [7]provac.comprovac.com