Comparison ledger
Applied Materials 0010-03485 Magnet Assy, Applied Materials MxP+ Poly, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-03485 Magnet AssyApplied Materials | MxP+ PolyApplied Materials |
|---|---|---|
| OEM | Applied Materials | Applied Materials |
| Category | — | — |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010-03485 Magnet Assy | Applied Materials MxP+ Poly |
| Cited variants | — |
|
| Specifications | ||
| Configuration | WP AL 300mm PVD[2] | — |
| OEM | Applied Materials[2] | — |
| Model | 0010-03485[2] | — |
| Description | MAGNET ASSY, WP AL 300MM PVD[3] | — |
| Process | PVD[4] | — |
| Wafer size | 300mm[5] | — |
| Version | Spares[5] | — |
| Part Number | 0010-03485[2] | — |
| Manufacturer | Applied Materials[2] | — |
| Process Type | PVD (Physical Vapor Deposition)[2] | Polysilicon Etch[6] |
| Application (Material) | Aluminum (AL)[2] | — |
| Wafer Diameter (associated) | 300 mm[2] | — |
| Wafer Size | — | 200mm[6] |
| Platform | — | Centura 5200[6] |
| Date of Manufacture | — | 1998[6] |
| Software Version | — | 4.9_15[6] |
| Orienter Quantity | — | 1[6] |
| MxP Poly Quantity | — | 1[6] |
| MxP+ Poly Quantity | — | 2[6] |
| eMxP+ ESC Quantity | — | 1[6] |
| End Point Detection | — | Monochromator[6] |
| Gases Used | — | NF3, CH3F, CL2, HBR, CHF3, AR, CF4, O2, N2, C4F8, CO, HE/O2[6] |
| MFCs | — | 32 Digital MFC's[6] |
| Robot | — | HP Robot[6] |
| Dry Pumps | — | 4-IQDP80, 2-IQDP80/WSU151[6] |
| Chillers | — | 5-Neslab-150[6] |
| Wafer Size (Asseta) | — | 6"[1] |
| ESC Type | — | Polymide[6] |