Comparison ledger
Applied Materials 0010-03254 E Chuck, Tokyo Electron 8 SE, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-03254 E ChuckApplied Materials | 8 SETokyo Electron |
|---|---|---|
| OEM | Applied Materials | Tokyo Electron |
| Category | — | — |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | — | Tokyo Electron 8 SE |
| Specifications | ||
| Configuration | — | High Temperature, Oxide[1] |
| OEM | — | Tokyo Electron[1] |
| Model | — | 8 SE[1] |
| Wafer size | — | 8 inch[1] |
| System description | — | High Temperature, Oxide[1] |
| Temperature range / max | — | 1200~1250*C[1] |
| Process | — | Wet Ox, can be used as Dry Ox[1] |
| Product family | — | TELFORMULA Alpha 303i / ATP Alpha 8-SE / ATP[2] |
| Footprint | — | Smallest footprint worldwide; 1100 mm wide[2] |
| Control | — | Equipped with proven ART (Adaptive Realtime Temperature) Control[2] |
| Productivity | — | High productivity powered by thermo plug[2] |
| Supported Wafer Size | — | 8 inch[1] |
| Process Type | — | High Temperature Oxide, Wet Oxidation, Dry Oxidation[1] |
| Maximum Temperature Range | — | 1200~1250 °C[1] |
| Product Series | — | ALPHA-303i series[2] |
| Machine Footprint Width | — | 1100 mm[2] |
| Temperature Control | — | ART (Adaptive Realtime Temperature) Control[2] |
| Compliance | — | JG/SEMI Standards[2] |
| Temperature range | — | 1200~1250°C[1] |
| Process type | — | High temperature oxide processing[1] |
| Oxidation type | — | Wet or dry oxidation[1] |