Comparison ledger
Applied Materials 0010-03254 E Chuck, STS 320, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-03254 E ChuckApplied Materials | 320STS |
|---|---|---|
| OEM | Applied Materials | STS |
| Category | — | — |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | — | STS 320 |
| Specifications | ||
| Reactive Ion Etch Type | — | Parallel-plate RIE[1] |
| RF Frequency | — | 13.56 MHz[1] |
| Driven Electrode Area | — | 900 cm²[1] |
| Process Gases | — | SF6, SF6+O2, CF4, CF4+O2[1] |
| Pressure (typical) | — | 55 mtorr[1] |