Comparison ledger
Applied Materials 0010-03254 E Chuck, Onto Innovation Nanospec 9300 Film Analysis, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-03254 E ChuckApplied Materials | Nanospec 9300 Film AnalysisOnto Innovation |
|---|---|---|
| OEM | Applied Materials | Onto Innovation |
| Category | — | — |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | — | Onto Innovation Nanospec 9300 Film Analysis |
| Specifications | ||
| Manufacturer | — | Onto Innovation / Nanometrics[1] |
| Model | — | Nanospec 9300[1] |
| Tool type | — | Film Analysis System[2] |
| Measurement application | — | Thin film thickness measurement[3] |
| Instrument type | — | Spectroscopic Reflectometer (SR)[3] |
| Configured wafer size | — | 12"[3] |
| Alternate wafer handling | — | Can be modified for 8" open cassette handling[3] |
| Visible light source | — | Tungsten halogen lamp[3] |
| UV light source | — | Deuterium arc lamp[3] |
| Lens | — | 4x, 15x (Visible & UV)[3] |
| System computer and monitor | — | Computer & LCD monitor[3] |
| Metrology software | — | Windows XP-based N2000 metrology software (Version N2000 4.2.90 Beta)[3] |
| Head type | — | UV DIO[3] |
| Video camera | — | RS170 (B/W)[3] |
| Wafer handling | — | Kensington Robot & Stage Asyst FOUP 300mm[3] |
| Input power | — | 208 VAC, 18 A, 50/60 Hz[3] |
| Optics | — | 4x, 15x (Visible & UV)[1] |
| Vintage year | — | 2002[3] |